1. System (1) for generating and controlling a non-thermal atmospheric pressure plasma, wherein the system (1) comprising:
– a plurality of discharge spaces (10, 10a, 10b, 10c), wherein each discharge space (10, 10a, 10b, 10e) has:
– a respective first opening (12, 12a, 12b, 12c) capable of introducing a working gas into the respective discharge space (10, 10a, 10b, 10c),
– an assigned second opening (14, 14a, 14b, 14c) through which the plasma can exit the respective discharge space (10, 10a, 10b, 10c),
– at least one high-voltage electrode (20, 20a, 20b, 20c) for generating an electromagnetic field for generating a plasma (5) in the respective discharge
space (10, 10a, 10b, 10e), so that in each discharge space (10, 10a, 10b, 10c), independently of the other discharge spaces (10, 10a, 10b, 10c), a plasma (5)
is generatable,
– a plurality of flow controllers (40, 40a, 40b, 40c), each flow controller (40, 40a, 40b, 40c) being assigned to a respective discharge space (10, 10a, 10b, 10c) for
controlling the plasma (5,6) exiting through the assigned second opening (14, 14a, 14b, 14c), wherein each flow controller (40, 40a, 40b, 40c) is formed to:
– set a volume flow (60) of the working gas through the respective first opening (12, 12a, 12b, 12c) of the respective discharge space (10, 10a, 10b, 10c)
from a working gas source (50, 50a, 50b) into the respective discharge space (10, 10a, 10b, 10c), and
– to adopt at least a first state and a second state, wherein in the first state no working gas from the working gas source (50, 50a, 50b) is supplied to the
respective discharge space (10, 10a, 10b, 10c), so that in the respective discharge space (10, 10a, 10b, 10c), even with generated electromagnetic field in
the respective discharge space (10, 10a, 10b, 10c), no plasma (5) exits from assigned second opening (14, 14a, 14b, 14c), and wherein in the second state
the working gas from the working gas source (50, 50a, 50b) is supplied to the respective discharge space (10, 10a, 10b, 10c) and a plasma (5) is generated
there, and the plasma (5, 6) exits from the assigned second opening (14, 14a, 14b, 14c),
characterized in that the system (1) is configured to generate at least one of a capacitively-coupled, an inductively-coupled and a microwave-induced plasma in the working gas supplied through the first opening.