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S2S Spatial Atomic Layer Deposition (SALD) system

Listing Description

The S2S Spatial ALD system combines atomic-scale precision with the speed and scalability needed for industrial success. Operating at atmospheric pressure and up to 300× faster than conventional ALD, it is flexible for R&D and robust for pilot production, enabling a seamless transition from lab innovation to full-scale manufacturing.

Offer Details

Specifications and Deliverables:

  • Substrate Size – Flexible, up to customer-defined dimensions

  • Supported Substrates – Glass, wafers, polymers films, metals, etc.

  • Operating Pressure – Atmospheric

  • Materials – AlOx, SnOx, TiOx, NiOx, AZO, HfOx, InOx, ZnOx, SiOx

Value Proposition:

The future of next-gen solar, batteries, green hydrogen, and advanced packaging depends on manufacturing tools that deliver both precision and scale. The S2S Spatial ALD system combines the flexibility of an R&D platform with the robustness and throughput of a pilot-production tool, achieving atomic-scale precision at up to 300× the speed of conventional ALD. Operating at atmospheric pressure and adaptable to diverse substrates and processes, it accelerates development, lowers costs, and bridges the gap from concept to industrial production.

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Fields of Application:

Solar energy, battery technology, green hydrogen/electrolysers, and advanced packaging.

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Adress:

Hastelweg 257
Eindhoven
Noord-Brabant
5652 CV
Netherlands

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