This technology provides the deposition of highly insulating thin films using reactive magnetron sputtering. The coatings offer excellent electrical insulation properties, including high specific resistance and dielectric strengths reaching several MV/cm, while also enabling thermal conductivity where required. Fraunhofer FEP utilizes advanced deposition systems, including double ring magnetron sources for stationary coating and rectangular magnetrons for dynamic coating of large substrates. The technology supports coating on both flat and 3D components, making it suitable for electronics, sensors, medical devices, and power electronics applications.
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Offer Details
Specifications and Deliverables:
• Reactive magnetron sputtering processes for insulating thin films
• Deposition rates of 2–4 nm/s for efficient production
• Film thickness from a few hundred nanometers up to several tens of micrometers
• Materials include Al2O3, AlON, SiO2, Si3N4, and HfO2 with high dielectric strength
• Breakdown voltages exceeding 6000 V (thickness dependent)
• Compatibility with various substrates (silicon wafers, steel, copper, etc.)
• Stationary coating up to Ø 200 mm and dynamic coating up to 650 mm × 750 mm
• Coating capability for both flat and 3D components
• Custom adaptation of film and layer stack properties (insulation, stress control)
• Film deposition, characterization (XRD, AFM, SEM, ellipsometry, insulation testing)
• Feasibility studies, research support, test reports, and sample depositions
Value Proposition:
• High-performance insulating coatings with exceptional dielectric strength
• High breakdown voltage capabilities for reliable operation in demanding environments
• Flexible coating solutions for both small and large substrates, including 3D parts
• Broad material portfolio enabling tailored insulation and thermal properties
• Scalable and industrially relevant magnetron sputtering processes
Input Required from Customer:
• Application requirements (e.g., electronics, sensor, or medical use case)
• Desired insulation performance and dielectric strength
• Substrate type, size, and geometry (flat or 3D)
• Material preferences or constraints
• Operating conditions (temperature, voltage, environment)
• Production scale and integration requirements
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Adress:
Dresden
Saxony
01277
Germany
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