This technology utilizes flash lamp annealing (FLA), also known as pulsed light or photonic curing, as an ultra-fast thermal post-treatment for surfaces and thin films. The process heats materials within microseconds to milliseconds using high-energy light pulses, enabling modification of material properties without damaging underlying substrates. Compared to conventional furnace annealing, FLA is faster, more energy-efficient, and minimizes thermal stress, diffusion, and unwanted chemical reactions. Fraunhofer FEP provides expertise in process development, optimization, and reliability assessment for a wide range of thin-film and surface applications.