This technology provides advanced large-area optical coatings, including anti-reflective (AR), filter, gradient-index, and interference multilayer coatings. Using pulse magnetron sputtering and magnetron PECVD, it enables high-rate and uniform deposition on substrates up to 0.6 × 1.2 m². The process supports static and dynamic coating modes, co-sputtering, and a wide range of materials such as oxides, nitrides, and transparent conductive coatings (ITO, AZO). In-situ optical monitoring and robust process control ensure high reproducibility and optical performance across applications in photonics, displays, sensors, and solar technologies.