The Helmholtz Innovation Lab Blitzlab is part of the Helmholtz-Zentrum Dresden-Rossendorf (HZDR). Blitzlab aims to develop and optimize methods of ultra-short-time annealing for various fields of application, such as functional semiconductor layers, printed electronics, battery technology, and photovoltaics. Blitzlab offers its cooperation partners access to a laboratory with several flash lamp and deposition solutions. In cooperation with the HZDR, many other methods of material treatment and material analysis can be used.
Listing Description
Offer Details
Specifications and Deliverables:
- Energy density: up to 200 Jcm-2
- Pulse duration: 0.33 – 20 ms
- Preheating: up to 700 °C
- FLA environment:
vacuum
inert gases
forming gas
non-flammable liquids - FLA regime (lamp field):
single pulse
combined pulse - Sample size: up to 150 mm
Value Proposition:
During flash lamp annealing an energy storage is discharged via a single flash lamp or a field of flash lamps in the range of milliseconds. The resulting broadband light pulse is absorbed by the sample and converted into heat and typically resulting in a temperature difference between the front and the rear of the sample. The optional pre-heating system in the back (usually a heating plate or halogen lamp) preheats the substrate. This enables higher maximum temperatures to be reached while reducing thermal stresses.
FLA is typically applied for:
- Layer crystallization
- Dopant activation
- Phase formation
- Defect curing
- Improvement of functional layer properties e.g., electrical conductivity, carrier lifetime, thermal conductivity
- Thermal treatment of layers on temperature sensitive substrates
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Adress:
Bautzner Landstraße 400
Dresden
Sachsen
01328
Germany
Dresden
Sachsen
01328
Germany