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Non-Thermal Atmospheric Pressure Plasma Jet (ntAPPJ)

Listing Description

The non-thermal atmospheric pressure plasma jet (ntAPPJ) is a sophisticated plasma technology designed for advanced applications such as surface modification, plasma-enhanced chemical vapor deposition (PECVD), and thin-film deposition. This technology operates under atmospheric conditions, utilizing a quartz capillary to produce a controllable plasma stream. It supports a range of noble gases with optional admixtures, making it highly adaptable for both industrial and research use.

Offer Details

Specifications and Deliverables:

  • Quartz capillary: 4 mm inner diameter, 6 mm outer diameter.
  • Operating frequency: 27.12 MHz.
  • Compatible gases: helium, neon, argon, krypton.
  • Gas flow rates: 0.1 to 2 slm.
  • Adjustable power range: 4 to 20 W.
  • Two outer ring electrodes: 5 mm width, 5 mm apart.
  • Inner capillary for precursor injection.
  • Technology Readiness Level: TRL 4

Value Proposition:

  • Eliminates the need for expensive and complex vacuum systems.
  • Provides precise and efficient plasma treatments under atmospheric conditions.
  • Offers high adaptability for diverse applications with flexible configurations.
  • Ensures easy integration into existing industrial or research setups.

Input Required from Customer:

• Specify the type of noble gas to be used (e.g., helium, neon, argon, krypton).
• Indicate any required admixtures or organic precursors.
• Provide details on the intended application, such as surface modification or PECVD, to optimize the plasma jet configuration.

Patent/Publication Number

Main Patent Claims:

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Location and Map

Adress:

Felix-Hausdorff-Straße 2
Greifswald
Mecklenburg-Vorpommern
17489
Germany

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