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HelixJet

Listing Description

The HelixJet is a capacitively coupled radio-frequency plasma source operating at atmospheric pressure. Its innovative double helix electrode design ensures stable and homogeneous plasma conditions at low gas flow rates, making it ideal for applications like plasma-enhanced chemical vapor deposition (PECVD) of silicon dioxide and plasma microprinting of polymeric profiles.

Offer Details

Specifications and Deliverables:

• Power: 30–100 W
• Frequency: 13.56 and 27.12 MHz
• Compatible Gases: Argon and its mixtures
• Gas Flow Rate: 100–2000 sccm
• Operating Pressure: 1 bar
• Technology Readiness Level: TRL 5

Value Proposition:

• Stable and homogeneous plasma at low gas flow rates
• Suitable for large-area surface treatments
• Operates at atmospheric pressure, removing the need for vacuum systems
• Innovative electrode design enhances process reproducibility
• Versatile applications in surface modification and coating

Input Required from Customer:

• Details of the specific application
• Material specifications
• Desired treatment outcomes
• Selection of process gases and flow rates

Patent/Publication Number

Main Patent Claims:

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Location and Map

Adress:

Felix-Hausdorff-Straße 2
Greifswald
Mecklenburg-Vorpommern
17489
Germany

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