Machine name: | Laser Structuring Facility |
Machine type: | Scanning R2R Ultra-Short Pulse Laser System |
Substrate types to be processed: | Polymers, Metals, Paper |
Substrate dimension: | 300 mm wide rolls, Installed in R2R Pilot-Line, A4 |
Technologies available: | Picosecond Laser, First & Second Harmonic (1064 nm and 532 nm) |
Typical applications: | Laser processing of printed polymers, Transparent Conductive Oxides, Metals, Development of Noble Metal Colloidal Nanoparticles based on Laser Ablation in Solvents Laser scribing for application in Organic Photovoltaics & OLEDs |
