Machine type: | System for gas aggregation sputtering+PECVD for nanoparticles in matrix |
Substrate types to be processed: | sheets |
Substrate dimension: | A4 size |
Technologies available: | Gas flow sputter source (sputtering + nanoparticle aggregation PECVD |
Deposition materials available: | Ag- SiOx |
Typical applications: | Sensors, PV systems, antibacterial layers |
