Machine type: |
System for gas aggregation sputtering+PECVD for nanoparticles in matrix |
Substrate types to be processed: |
sheets |
Substrate dimension: |
A4 size |
Technologies available: |
Gas flow sputter source (sputtering + nanoparticle aggregation PECVD |
Deposition materials available: |
Ag- SiOx |
Typical applications: |
Sensors, PV systems, antibacterial layers |
