Machine type: | ALD deposition chamber connected inert glovebox system |
Substrate types to be processed: | Silicon wafers, glass substrates, plastic substrates |
Substrate dimension: | 150 x 150 mm |
Technologies available: | Atomic layer deposition (ALD) |
Deposition materials available: | ALD precursors for the deposition of Al2O3, TiO2, ZrO2, Pd |
Typical project fields: | Organic electronic devices, barrier layer deposition |
