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Magnetron sputtering - flash lamp annealing (sputter-FLA)

Listing Description

The Helmholtz Innovation Lab Blitzlab is part of the Helmholtz-Zentrum Dresden-Rossendorf (HZDR). Blitzlab aims to develop and optimize methods of ultra-short-time annealing for various fields of application, such as functional semiconductor layers, printed electronics, battery technology, and photovoltaics. Blitzlab offers its cooperation partners access to a laboratory with several flash lamp and deposition solutions. In cooperation with the HZDR, many other methods of material treatment and material analysis can be used.

Offer Details

Specifications and Deliverables:

  • Manufacturer: Rovak GmbH
  • Substrate sizes: up to 300 x 200 mm2
  • Annealing environment: vacuum, inert gases, oxygen, forming gas
  • Preheating: up to 200 °C
  • Flash mode (single lamp):
    single pulse
    multi-flash up to 10 Hz
  • Pulse duration: 0.33 – 3 ms
  • Energy density: up to 30 Jcm-2

Value Proposition:

The sputter-FLA-tool combines DC magnetron sputtering technology with the ultra-short flash lamp annealing method. The tool offers the possibility to perform the deposition and thermal treatment under vacuum conditions without intermediate air exposure.

  • Deposition:
    Metals
    Group IV semiconductors
    Compounds e.g., ZnO, TiN, AZO
  • In-situ annealing for:
    contact formation
    crystallization

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Location and Map

Adress:

Bautzner Landstraße 400
Dresden
Sachsen
01328
Germany

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