The Helmholtz Innovation Lab Blitzlab is part of the Helmholtz-Zentrum Dresden-Rossendorf (HZDR). Blitzlab aims to develop and optimize methods of ultra-short-time annealing for various fields of application, such as functional semiconductor layers, printed electronics, battery technology, and photovoltaics. Blitzlab offers its cooperation partners access to a laboratory with several flash lamp and deposition solutions. In cooperation with the HZDR, many other methods of material treatment and material analysis can be used.
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Magnetron sputtering - flash lamp annealing (sputter-FLA)
Listing Description
Offer Details
Specifications and Deliverables:
- Manufacturer: Rovak GmbH
- Substrate sizes: up to 300 x 200 mm2
- Annealing environment: vacuum, inert gases, oxygen, forming gas
- Preheating: up to 200 °C
- Flash mode (single lamp):
single pulse
multi-flash up to 10 Hz - Pulse duration: 0.33 – 3 ms
- Energy density: up to 30 Jcm-2
Value Proposition:
The sputter-FLA-tool combines DC magnetron sputtering technology with the ultra-short flash lamp annealing method. The tool offers the possibility to perform the deposition and thermal treatment under vacuum conditions without intermediate air exposure.
- Deposition:
Metals
Group IV semiconductors
Compounds e.g., ZnO, TiN, AZO - In-situ annealing for:
contact formation
crystallization
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Adress:
Bautzner Landstraße 400
Dresden
Sachsen
01328
Germany
Dresden
Sachsen
01328
Germany