We are focus on low temperature CVD Processing. We use metalorganic (MO) Precursor to lower the deposition temprature below 500°C.

We design Layers to fullfill demands for harsh enviroment of future demands. We are able to create Multilayerstructure, kristalline or

For the deposition of Carbide or Nitride from the Metal Tungsten, Molybdenum and Chromium we produce the analog metalcarbonyls. The

To support MOCVD Processes we use industrial precursor-systems. Mainly Metalacetylacetonates or -carbonyles. The consistence is from powdery. We produce feeding-

To utilize the coating reactors we are also able to coat parts and tools with dedicated coating. The processing is