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LBnano
Machine type: | System for gas aggregation sputtering+PECVD for nanoparticles in matrix |
Substrate types to be processed: | sheets |
Substrate dimension: | A4 size |
Technologies available: | Gas flow sputter source (sputtering + nanoparticle aggregation PECVD |
Deposition materials available: | Ag- SiOx |
Typical applications: | Sensors, PV systems, antibacterial layers |
Deliverables
Specifications and Deliverables
Gas flow sputter source (sputtering + nanoparticle aggregation
PECVD
PECVD
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