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00 Reviews


Machine type:

System for gas aggregation sputtering+PECVD for nanoparticles in matrix

Substrate types to be processed:


Substrate dimension:

A4 size

Technologies available:

Gas flow sputter source (sputtering + nanoparticle aggregation

Deposition materials available:

Ag- SiOx

Typical applications:

Sensors, PV systems, antibacterial layers


Specifications and Deliverables
Gas flow sputter source (sputtering + nanoparticle aggregation

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Daniel Gloess

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