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Nano-Imprint-Lithography test facilities

Machine name:

Thermal nanoimprint module (Can be integrated into CC08 and LS29)

Machine type:

Roll-to-Roll lamination

Substrate types to be processed:

Various types (e.g., polymer films, cellulose based films, etc.)

Substrate dimension:

Maximum 550 mm working width, continuous roll

Technologies available:

Nitrogen protective atmosphere, inert lamination

Deposition materials available:

Wide range of materials

Typical applications:

optical security films, degradable packaging, recyclable packaging

Deliverables

Specifications and Deliverables
Substrate types to be processed: Various types (e.g., polymer films, cellulose based films, etc.)
Substrate dimension: Maximum 550 mm working width, continuous roll

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