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Nano-Imprint-Lithography test facilities
Machine name: | Thermal nanoimprint module (Can be integrated into CC08 and LS29) |
Machine type: | Roll-to-Roll lamination |
Substrate types to be processed: | Various types (e.g., polymer films, cellulose based films, etc.) |
Substrate dimension: | Maximum 550 mm working width, continuous roll |
Technologies available: | Nitrogen protective atmosphere, inert lamination |
Deposition materials available: | Wide range of materials |
Typical applications: | optical security films, degradable packaging, recyclable packaging |
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Specifications and Deliverables
Substrate types to be processed: Various types (e.g., polymer films, cellulose based films, etc.)
Substrate dimension: Maximum 550 mm working width, continuous roll
Substrate dimension: Maximum 550 mm working width, continuous roll
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viewed this listing at 2023-11-17 11:11:03
