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LBnano

Machine type:

System for gas aggregation sputtering+PECVD for nanoparticles in matrix

Substrate types to be processed:

sheets

Substrate dimension:

A4 size

Technologies available:

Gas flow sputter source (sputtering + nanoparticle aggregation
PECVD

Deposition materials available:

Ag- SiOx

Typical applications:

Sensors, PV systems, antibacterial layers

Deliverables

Specifications and Deliverables
Gas flow sputter source (sputtering + nanoparticle aggregation
PECVD

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Daniel Gloess

Member since 6 months ago
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