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Sheet-to-sheet atomic layer deposition (ALD)
Machine type: | ALD deposition chamber connected inert glovebox system |
Substrate types to be processed: | Silicon wafers, glass substrates, plastic substrates |
Substrate dimension: | 150 x 150 mm |
Technologies available: | Atomic layer deposition (ALD) |
Deposition materials available: | ALD precursors for the deposition of Al2O3, TiO2, ZrO2, Pd |
Typical project fields: | Organic electronic devices, barrier layer deposition |
Deliverables
Specifications and Deliverables
Organic electronic devices, barrier layer deposition
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