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Sheet-to-sheet atomic layer deposition (ALD)

Machine type:

ALD deposition chamber connected inert glovebox system

Substrate types to be processed:

Silicon wafers, glass substrates, plastic substrates

Substrate dimension:

150 x 150 mm

Technologies available:

Atomic layer deposition (ALD)

Deposition materials available:

ALD precursors for the deposition of Al2O3, TiO2, ZrO2, Pd

Typical project fields:

Organic electronic devices, barrier layer deposition


Specifications and Deliverables
Organic electronic devices, barrier layer deposition

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