Roll-to-roll atomic layer deposition (ALD)
Machine type: | Roll-to-Roll Atomic Layer Deposition |
Substrate types to be processed: | Polymer films, metal foils |
Substrate dimension: | Width: 335 – 370 mm Core: 3 and 6 in Roll diameter: up to 280 mm |
Technologies available: | Atmospheric Spatial ALD |
Deposition materials available: | Al2O3 |
Typical applications: | Permeation barriers, coatings for batteries |
Deliverables
Specifications and Deliverables
Permeation barriers, coatings for batteries
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