Vacuum coating – Physical vapor deposition PVD
Our PVD plant enables us to evaporate metals (e.g. Al, Cr, Ti) and oxides (e.g. Al2O3, MgO, SiOX) and deposit them on web-shaped substrates. These thin functional layers have a thickness in the nano range (less than 100 nm) and are applied to films and paper. Our facilities are prepared to perform plasma pre-treatments (e.g. with O2, N2, NH3 as reactive gases) and with our know-how we can perform the analysis and characterisation of the pre-treatment and coating processes.
To optimise the layer design of multilayer films, we have state-of-the-art equipment for vacuum coating, lacquering, laminating and extrusion. We can optimise each step individually or in combination.
The use of high functionality nanocoatings via vacuum coating will lead you to cost savings, weight savings and reduced environmental impact through material optimisation.