Our PVD plant enables us to evaporate metals (e.g. Al, Cr, Ti) and oxides (e.g. Al2O3, MgO, SiOX) and deposit them on web-shaped substrates. These thin functional layers have a thickness in the nano range (less than 100 nm) and are applied to films and paper. Our facilities are prepared to perform plasma pre-treatments (e.g. with O2, N2, NH3 as reactive gases) and with our know-how we can perform the analysis and characterisation of the pre-treatment and coating processes.

To optimise the layer design of multilayer films, we have state-of-the-art equipment for vacuum coating, lacquering, laminating and extrusion. We can optimise each step individually or in combination.