Dual Beam FIB-SEM Helios 450S
A highly versatile tool that combines SEM with a focused ion beam (FIB) of gallium ions. The SEM operates with a field emission gun (FEG) that provides high beam intensity and stability. Imaging can be done with secondary (for SEM and FIB) and backscattered (for SEM) electrons.
A STEM detector delivers a resolution of 0.8 nm at 30 kV. For element analysis and mapping, an EDX detector is available. An ultra-high resolution (UHR) stage and flip stages are available inside the microscope.
Deliverables
Specifications and Deliverables
• Voltage (e-/i+ ): 0.5 – 30 kV
• HRSEM Imaging (Resolution 0.9 nm)
• FIB – Ga+ ions (Imaging/Patterning)
• EDX (Chemical analysis)
• Lamella preparation
• Cross section analysis
• Slice & View (3D reconstruction)
• Patterning: Milling/Deposition (Pt or W)
• Enhanced etching (Iodine) and Selective Carbon
Etching (MgSO4 · 7H2O)
• HRSEM Imaging (Resolution 0.9 nm)
• FIB – Ga+ ions (Imaging/Patterning)
• EDX (Chemical analysis)
• Lamella preparation
• Cross section analysis
• Slice & View (3D reconstruction)
• Patterning: Milling/Deposition (Pt or W)
• Enhanced etching (Iodine) and Selective Carbon
Etching (MgSO4 · 7H2O)
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