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An ultra-high vacuum (UHV) system to analyze the chemical composition of samples by means of X-ray Photoelectron Spectroscopy (XPS). It has a depth resolution of 1-10 nm via depth profiling and lateral resolution down to ~1 μm.

The complementary techniques that are also available are reflection electron energy loss spectroscopy (REELS), ion scattering spectroscopy (ISS) and ultraviolet photoelectron spectroscopy (UPS).


Specifications and Deliverables
• Electron Analyser ( 0 – ±5000 eV)
• Detection System (6 channels, 2D position detector)
• X-ray Sources (Monochromatic Al K and twin anode
Mg K/ Al K)
• Sample Navigation and Manipulation (Automated
Sample Manipulator and Azimuthal stage Rotation)
• Heating and Cooling of Specimen
• UV Source
• Flood Sources (Charge compensation and REELS)
• Monoatomic and Gas Cluster Ion Source for depth
profiling “soft” (cluster mode) and solid (monoatomic
mode) materials

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